Our Products
Single Crystal CVD Diamond Plate
Product Description
Single-crystal CVD diamond plates offer superior thermal conductivity (up to 2200 W/m·K), making them ideal for heat dissipation in high-power electronics, lasers, RF devices, and semiconductors.
Size : 2mm to 20mm
Specifications and Tolerances
Edges: Laser Cut
Face / Surface Orientation: 100
Laser Kerf: 3°
Lateral Tolerance: +0.2/-0 mm
Side 1, Roughness, Ra: polished, Ra < 2 - 30 nm
Side 2, Roughness, Ra: polished, Ra < 2 - 30 nm
Thickness Tolerance: +/- 0.05 mm
Thickness Dimension: 0.3-0.5mm
Material Properties
Nitrogen concentration: < 5 ppb ( Optional ) N2 Controlled based on Requirements
Advantage
Exceptional thermal conductivity : Higher than polycrystalline, offering superior heat dissipation.
Isotropic properties : Uniform thermal performance in all directions, ideal for precision applications.
High thermal stability : Performs well at extreme temperatures without degradation.
Electrical insulation : Non-conductive, useful in electronic devices requiring thermal control without affecting electrical circuits.
Minimal defects : Ensures higher reliability and efficiency in sensitive thermal management systems.
Durability: Resistant to wear and chemical exposure, prolonging lifespan in demanding environments.
PolyCrystal CVD Diamond Wafer
Product Description
Polycrystalline CVD diamond (PCD) plates provide excellent thermal management with high thermal conductivity, though slightly lower than single-crystal diamonds. They are ideal for use in heat sinks and spreaders in electronics, RF devices, and power systems, offering efficient heat dissipation and enhanced durability, which helps improve the longevity and reliability of electronic components in demanding environments.
Specifications and Tolerances
Diameter: 10 mm to 100 mm
Thickness: 300um & 500um
Thermal conductivity: Up To 1800 W/mK
Surface : As grown & polished one /two side with 20nm
Thickness Tolerance : +/- 5%
Transmittance : up to 65%
Advantage
High thermal conductivity : Superior heat dissipation, ideal for high-power electronics.
Low thermal expansion : Reduces stress between materials during temperature changes.
Chemical stability : Resistant to oxidation and chemical reactions at high temperatures.
Wear resistance : Ensures durability and long-lasting performance in harsh environments.
Radiation resistance : Suitable for space and high-radiation environments.
Electrical insulation : Useful in applications requiring thermal management without electrical conductivity.
Ultra-High Purity 30 to 50 μm Epi Layer on SCD
Size – 5mm to 20mm
Specifications and Tolerances
Boron concentration: < 5 ppb
Surface roughness: < 2 nm
Nitrogen concentration: < 5 ppb
Orientation: Typically (100)
Applications
High-frequency and high-power electronic devices
Optical windows with ultra-low absorption
Quantum optics: NV⁰ and NV⁻ centre stability
Ultrafast photodetectors
Industries
Quantum Photonics
Laser & LIDAR Systems
High-Frequency RF/Power Electronics
Advanced Sensor Technologies
Cu-Diamond Composite Material
Specifications and Tolerances
Thermal conductivity: 500–700 W/m·K
CTE tailored to match Si or GaN
Thickness: 0.5 mm – 5 mm or as per customised design
Surface: Lapped, Laser Cut
Applications
High-power RF amplifier baseplates
Space-grade thermal interface materials
IGBT module heat sinks
LED packaging
Industries
Power Electronics
Satellite and Defense Avionics
Automotive EV Modules
LED Packaging
Boron Doped SCD Diamond
Size : 2mm to 20mm
Specifications and Tolerances
Thickness: 0.3 mm – 1 mm
Boron concentration: 1017–1021 atoms/cm3
Orientation: (100)
Electrical conductivity: from semiconductor to metallic behaviour
Resistivity: ~1 mΩ·cm (highly doped)
Surface roughness: Polished up to 2nm
Applications
Electrochemical sensors and electrodes
Radiation-hardened electronics
p-type semiconductor devices
Industries
Harsh-Environment Electronics (space, nuclear)
Diamond-based Transistors
Electrochemical Sensing
Aluminium-Diamond Composite Plates
Specifications and Tolerances
Diamond volume fraction: 30–50%
Thermal conductivity: 350–500 W/m·K
CTE matched with Si or GaAs
Surface treatment: Lapped, Laser Cut
Thickness: 0.3 mm – 10 mm or as per customised design
Applications
Heat spreaders in telecom and radar
Optoelectronic devices thermal management
Laser diode mounting
LED arrays
Industries
Telecom Infrastructure
Medical Lasers
Consumer Electronics
Aerospace Electronics
GaN on Diamond
Specifications and Tolerances
GaN thickness: 0.5 μm – 5 μm
Substrate: SCD (100) or (111), polished
Interface: Buffer layer (e.g., AlN or AlGaN)
Crystalline quality: Low dislocation density
Thermal resistance: Ultra-low (< 0.1 K/W)
Applications
GaN HEMTs with high power density
Next-gen radar and communication systems
RF and 5G devices
Thermal management-critical devices
Industries
Wireless Communications
5G Infrastructure
Military Radar
High-Power Electronics
GaN Bonded on PCD Wafer (4-inch)
Specifications and Tolerances
PCD wafer: 2-4 inch, 300–500 μm thick
GaN layer: Transferred or bonded
Bonding method: Plasma-assisted
Interface thermal resistance: Minimized for high-power use
Applications
GaN-on-Diamond HEMTs
GaN LEDs with enhanced heat dissipation
Pulsed RF Power Amplifiers
Monolithic microwave integrated circuits (MMICs)
Industries
RF & Microwave
High-Speed Switching Systems
Space-grade Electronics
Defence Electronics